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金时勋(Syhoon KIM) 辨理士

金时勋 辨理士
金时勋 辨理士

金时勋(Syhoon KIM) 辨理士

T.+82-2-6488-4005F.+82-2-2122-3800E.shkim7@kimchang.com

专业领域

简介

Syhoon Kim received his B.S. in Electrical Engineering from Seoul National University in 2007 and passed the Korean Patent Bar Examination in 2006. 

Prior to joining Kim & Chang, Mr. Kim worked as a patent attorney at FirstLaw Lee & Ko for about four years. During that period, he handled patent prosecution matters of various countries including the United States, Japan, Europe, China, and Korea.

Before he passed the Korean Patent Bar Examination, as a substitute for the mandatory military service, he worked at Comtec Systems Co., Ltd, one of the largest network device manufacturers in Korea. He worked in the Research and Development Team of the firm, and gained practical experiences in both the software and hardware fields there. One of his developments is a network router which was installed in the Korea Exchange network.

人物简介

经历

Kim & Chang (2011-Present)

FirstLaw Lee & Ko (2007-2011)

Comtec Systems Co., Ltd. (2002-2004)

主要案例查看全部

Patent Litigation/Dispute
  • Represented global LED manufacturer in patent infringement, invalidation, and Korea Trade Commission action
  • Represented global display manufacturer in patent invalidation action
  • Represented global semiconductor manufacturer in patent invalidation action
  • Represented patent licensing negotiations
 
Patent Prosecution
  • Prosecuted Korean and foreign patent applications of Korean and foreign companies (technology areas including semiconductor, display, electronic components, telecommunication, software, etc.)
  • Strategy consulting for establishing and managing global patent portfolio
 
Others
  • Analysis of patent infringement and validity (technology areas including semiconductor, display, fintech, etc.)
  • Patent prior art search and freedom-to-operate search

学历

UCLA School of Law (LL.M., 2016) 

Department of Electrical Engineering, Seoul National University (B.S., 2007)

取得资格

Admitted to patent bar, Korea, 2006

语言

Korean, English, Japanese

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金时勋(Syhoon KIM)
辨理士


T. +82-2-6488-4005      
F. +82-2-2122-3800
     


  




Syhoon Kim received his B.S. in Electrical Engineering from Seoul National University in 2007 and passed the Korean Patent Bar Examination in 2006. 

Prior to joining Kim & Chang, Mr. Kim worked as a patent attorney at FirstLaw Lee & Ko for about four years. During that period, he handled patent prosecution matters of various countries including the United States, Japan, Europe, China, and Korea.

Before he passed the Korean Patent Bar Examination, as a substitute for the mandatory military service, he worked at Comtec Systems Co., Ltd, one of the largest network device manufacturers in Korea. He worked in the Research and Development Team of the firm, and gained practical experiences in both the software and hardware fields there. One of his developments is a network router which was installed in the Korea Exchange network.






    Kim & Chang (2011-Present)

    FirstLaw Lee & Ko (2007-2011)

    Comtec Systems Co., Ltd. (2002-2004)






Patent Litigation/Dispute
  •   Represented global LED manufacturer in patent infringement, invalidation, and Korea Trade Commission action
  •   Represented global display manufacturer in patent invalidation action
  •   Represented global semiconductor manufacturer in patent invalidation action
  •   Represented patent licensing negotiations
 
Patent Prosecution
  •   Prosecuted Korean and foreign patent applications of Korean and foreign companies (technology areas including semiconductor, display, electronic components, telecommunication, software, etc.)
  •   Strategy consulting for establishing and managing global patent portfolio
 
Others
  •   Analysis of patent infringement and validity (technology areas including semiconductor, display, fintech, etc.)
  •   Patent prior art search and freedom-to-operate search





学历

    UCLA School of Law (LL.M., 2016) 

    Department of Electrical Engineering, Seoul National University (B.S., 2007)


取得资格

    Admitted to patent bar, Korea, 2006


语言
  •    Korean, English, Japanese





发明·实用新型 ,  日本(IP) ,  电子·半导体 ,  软件·计算机·商业方法 ,  海外知识产权申请